HSU, C.-Y.; WU, J.-Z. Error-Smoothing Exponentially Weighted Moving Average for Improving Critical Dimension Performance in Photolithography Process. International Journal of Industrial Engineering: Theory, Applications and Practice, [S. l.], v. 23, n. 5, 2017. DOI: 10.23055/ijietap.2016.23.5.3131. Disponível em: https://ijietap.journals.publicknowledgeproject.org/ijietap/index.php/ijie/article/view/3131. Acesso em: 25 nov. 2024.